Configuration

Wafer: 4”, 5”, 6" or 8" (Notch or Flat)

Reticle: 6" Square

General Specification and Information:

Model: FPA 3000 i5+

First year available: 1999

Lens Type: UL34II

Stage Type: FLAT

Chamber Type: CD 83

Projection Optics

Projection Magnification: 1/5 X

Exposure Light: 365nm

Numerical Aperture: 0.45 – 0.63nm

Field Size: 22mm (17x26mm)

Standard Illumination

Exposure Light: i-Line

Light Source: 2.7kW Super High Pressure Hg Lamp

Intensity: >13000W/m2

Uniformity: < 1.0%

Masking Blade Accuracy: Grey Zone ≤60um

Printing Performance:

Resolution:< 0.25µm

Depth of Focus: R≥1.2µm (Target Line Width= 0.35um L&S)

Image Field Deviation: ≤20µm (HV Difference)

Distortion: <±35nm

Focus/Leveling Performance:

Focus Repeatability: <0.10µm (3sigma)

Leveling Repeatability: <7ppm (3sigma)

Wafer Alignment Performance:

Lighting Source: He-Ne Laser, Broad Band(Halogen Lamp)

Signal Process: TV Image Processing

System: Off Axis TTL

Mode: AGA

Standard Stage Specification:

Step Accuracy: <0.035µm (3sigma)

Scaling: <±0.5ppm

Orthogonality: <±0.5ppm

Standard Alignment Specification:

Reticle Rotation Accuracy: <±0.01µm

Wafer Alignment: <0.05µm mean + 3sigma

Reticle Rotation Repeatability: <0.015µm

Reticle

Standard Size: 6" square t=0.25" ( Patticle checker)

Material: Quartz

Pattern Material: 2 layer CR, 3 Layer CR

Pellicle Frame: Pattern Side only Stand Off= 6.3mm

Reticle Particle Checker Specification:

Detection Resolution

Pattern Surface: >0.6µm

Glass Surface: >15µm

Pellicle Surface: >20µm

Detection Repeatability: >95%

Wafer Size: Standard 8” ( 4” thru 8” SEMI Standard, JEIDA,Notch / Flat, Optional)

Throughput: 102wph 200mm ( 8” Wafer)

Throughput: 120wph 150mm ( 6” Wafer)

Environmental Chamber Specification: N/A

Cleanness: Class 1(>0.1µm)

Chamber Specifications:

Chamber Type: CD83

Air Conditioner: Y77-1813 (CC150X16)

Refrigerant: HCFC22

Gram (g): 5000

Pounds (lbs): 11.02