RTP-150, RTP-150-HV

● Rapid Thermal Annealing Process Oven with vacuum

● 7“ Touch Panel

● Programmable temperature profiles

● Record of process data

Application

The RTP-150 Rapid Thermal Annealing Vacuum oven is an ex cellent tool for various semiconductor up to 150 mm diameter wafer, solar wafer M6 or solar wafer M10 or 156 x 156 mm substrate size.

Some examples for applications: Laboratory furnace for all kind of developers implementing and researching new processes,prototype research, environmental research purposes and for small pre-series or series.Process Gases

The RTP-150 can be used with standard process gases, like Nitrogen, Oxygen, Forming Gas. The chamber is sealed and can easily be cleaned.

Gas flow Control

One gas line with Mass Flow Controller (MFC) for Nitrogen (5 nlm = norm liter per minute) is default, three more gas lines (Option: Mass Flow Controller) are possible.

Vacuum

The system is vacuum capable of up to 10-3 hPa. For higher

vacuum we offer the model RTP-150-HV (up 10 10-6 hPa).

Heating

The maximal achievable temperature is 1200 °C. Key features

are precisely controlled fast ramp-up 75 K/sec), optionally up to

150 K/sec) and excellent ramp-down rates (depends on tem

perature and loading).

Temperature

The RTP-150 allows an excellent temperature distribution and homogeneity. Optionally a graphite susceptor can be inserted into the quartz chamber (Option: GP Graphite Plate or Susceptor).