Description

The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass

production.

The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be

configured with a number of options that enable low-k 1 in manufacturing, extending application of the PAS 5500/1150C

below 90 nm.

Key Features and Benefits

Variable 0.75-NA 193-nm Projection Lens with Advanced Lens Manipulators Production resolution down to 90 nm.

AERIAL II Illuminator

Provides the ultimate flexibility in illumination modes at maximum throughput.

PAS 5500 Step-and-Scan Body

Commonality with i-line and KrF Step-and-Scan tools for economic mix-and-match.

ATHENA Advanced Alignment Combined With Reticle Blue Align

Increased alignment accuracy for a wide variety of processes.

Ultra stable over time.

20-W ArF Laser With Variable Laser Frequency Control

High power 4-kHz laser enabling maximum throughput over a large dose range.

Batch Streaming With ARMS

Continuous-flow manufacturing.

Image Streaming Package

For enhanced productivity.